Only by using an NTT-AT EUV half mirror, also known as a EUV multilayer beam splitter, can an interferometer for the extreme ultraviolet region be configured, operating in a similar way to those for the visible region and the normal UV region. This free-standing Mo/Si multilayer is applied to various applications in the EUV field such as EUV/X-ray microscopes, EUV/X-ray astronomical telescopes, EUV pump-probe experiments and EUV beam monitor systems.
The proprietary technologies of free-standing thin-film formation, derived from semiconductor process technology, and EUV multilayer formation, derived from optical coating technology, have enabled NTT-AT to develop and sell the EUV half mirror.
· Holder diameter: 25.4mm
· Half mirror area: 10mm x 10mm
· Incident angle: between 0 degrees and 45 degrees
· Center wavelength: 13.5nm and 13.9nm
(Customization is available upon request.)
The Mo/Si free-standing multilayer EUV half mirror is designed and manufactured with 30% reflectivity and 30% transmittance at an approximate wavelength of 13nm. A customized design is available with a specific incident angle, center wavelength, etc, on request.
The EUV half mirror (or EUV beam splitter) is the key component required to configure an EUV phase interference microscope. The EUV phase interference microscope is being studied as a powerful tool for defect inspections in EUV lithography masks and mask blanks.