EUV Mirrors/X-ray Mirrors

Description

NTT-AT has been supplying high-quality XUV, EUV, and X-ray mirrors for more than 20 years, it provides custom-designable multi-layer film mirrors adapted to meet individual customer requirements.

Since the 1990s, NTT-AT has developed and sold extreme ultraviolet (XUV or EUV) multi-layer mirrors and X-ray mirrors. The design of these mirrors reflects the feedback received from university, research institute, and enterprise customers in Asia, North America, South America, and Europe. Its vast reservoir of accumulated know-how and reliable technologies are what support the production of your multi-layer mirror.



Features

Multi-layer materials and structure are customized to meet your detailed specifications, such as substrate, peak wavelength, bandwidth, and dispersion. High heat-durability multi-layer mirrors are also supported. A reflectivity evaluation service using synchrotron facilities is also available as an option.


Parameter


Application example


Substrate
materials

Typical
wavelength

XUV (EUV) mirror

EUV lithography
High-order harmonics applications
Attosecond science
X-ray laser

Multi-layer mirror

Mp/Si
Ru/Si
Zr/Al
SiC/Mg
Cr/C
50 eV ~100 eV
50 eV~100 eV
50 eV ~ 70 eV
25 eV ~50 eV
~300 eV

Single layer mirror

SiC
Pt
Ru

10 eV ~ 100 eV

X-ray mirror

Synchrotron applications
XFEL applications
Built into X-ray non-destructive
inspection devices

Multi-layer mirror

W/C
W/B4C
Ru/C
Pt/C

1 keV ~ 30 keV

Single layer mirror

C
B4C
SiC
Cr
Ni

1 keV ~ 30 ke



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